Patent · US Active

Electrode assembly and plasma source for generating a non-thermal plasma, and method for operating a plasma source

US10470285B2 · kind B2 · utility

0Cited by
5References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 21, 2016
Grant dateNov 5, 2019
Priority date
Expiry dateJul 21, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/46
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The invention relates to an electrode assembly (5) for generating a non-thermal plasma, comprising a first electrode (7) and a second electrode (9) which are electrically insulated from each other by means of a dielectric element (11) and which are arranged at a distance from each other. The first electrode (7) has a thickness of at least 10 μm when seen in the direction of the distance between the electrodes (7, 9), and the second electrode (9) has a thickness of at least 1 μm to maximally 5 μm or a thickness of at least 5 μm to maximally 30 μm when seen in the direction of the distance between the electrodes (7, 9). The dielectric element (11) has a thickness of at least 10 μm to maximally 250 μm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.