Method for forming regular polymer thin films using atmospheric plasma deposition
US10471465B2 · kind B2 · utility
1Cited by
0References
23Claims
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Assignee
Inventors
Key dates
| Filing date | May 6, 2015 |
| Grant date | Nov 12, 2019 |
| Priority date | — |
| Expiry date | Nov 24, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.