System for analysing a transparent sample with control of position, and associated method
US10473576B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 23, 2015 |
| Grant date | Nov 12, 2019 |
| Priority date | — |
| Expiry date | Mar 14, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30024
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for analyzing a transparent particle including: an analysis pathway, including a first light source emitting an analysis light beam, and a first optical system focusing the analysis light beam in a focusing plane; and a position control pathway including a second light source, an image sensor, and a second optical system at least partially merged with the first optical system. The image sensor is offset relative to the image of the focusing plane by the second optical system. The system makes it possible to control correct positioning of the particle, even though it is transparent, and without disturbing the analysis pathway.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.