Patent · US Active

Method for preparing layered metal oxide field effect material

US10475933B1 · kind B1 · utility

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12Claims
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Key dates

Filing dateOct 12, 2018
Grant dateNov 12, 2019
Priority date
Expiry dateOct 12, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K77/111

Abstract

A method for preparing a layered metal oxide field effect material includes depositing a first metal oxide, a core-layer metal, and a second metal oxide sequentially on the substrate by vacuum vapor deposition, the first metal oxide and the core-layer metal undergoing a redox reaction to form a first surface layer and a core-layer precursor on the substrate, and the core-layer precursor and the second metal oxide undergoing a redox reaction to form a core layer and a second surface layer; and the band gap of the metal oxide in the core layer is ≥3 eV, the band gaps of the metal oxide in the first surface layer and the second surface layer are independently ≤3 eV, and the difference between the band gap of the metal oxide in the core layer and the band gap of the metal oxide in the first surface layer is ≥1 eV. The present preparation method has advantages of simple operation, a low production cost, a good film forming property, and the high carrier mobility of the product.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.