Patent · US Active

Optoelectronic semiconductor chip and method for the production thereof

US10475951B2 · kind B2 · utility

1Cited by
37References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 28, 2014
Grant dateNov 12, 2019
Priority date
Expiry dateMar 28, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/825
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method for producing an optoelectronic semiconductor chip is disclosed. A substrate is provided and a first layer is grown. An etching process is carrying out to initiate V-defects. A second layer is grown and a quantum film structure is grown. An optoelectronic semiconductor chip is also disclosed. The method can be used to produce the optoelectronic semiconductor chip.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.