Optoelectronic semiconductor chip and method for the production thereof
US10475951B2 · kind B2 · utility
1Cited by
37References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2014 |
| Grant date | Nov 12, 2019 |
| Priority date | — |
| Expiry date | Mar 28, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/825
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for producing an optoelectronic semiconductor chip is disclosed. A substrate is provided and a first layer is grown. An etching process is carrying out to initiate V-defects. A second layer is grown and a quantum film structure is grown. An optoelectronic semiconductor chip is also disclosed. The method can be used to produce the optoelectronic semiconductor chip.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.