Patent · US Active

Microwave plasma torch generating laminar flow for materials processing

US10477665B2 · kind B2 · utility

24Cited by
95References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 13, 2012
Grant dateNov 12, 2019
Priority date
Expiry dateAug 7, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/30
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A microwave plasma torch providing two laminar flows is described. Two laminar flows are created using a set of at least three concentric, staggered dielectric tubes connected to a pressurized gas source. An inner laminar flow entrains injected particles entering the plasma. An outer laminar flow creates a sheath around the plasma and prevents it from attaching to the walls of the plasma torch. The entry point of the gas source is designed to ensure laminar flow for both the entrainment of the particles and for the shielding of the plasma plume. The uniform processing conditions results in uniform particles and a homogenous materials distribution. This enables a final product with improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses. The microwave plasma torch can be used for producing nanomaterial powder and for spray coating materials onto various substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.