Patent · US Active

Nanograting method and apparatus

US10481317B2 · kind B2 · utility

35Cited by

24References

12Claims

0Family size

Assignee

Magic Leap, Inc. · US

Inventors

Christophe Peroz · San Francisco, US
Mauro Melli · San Leandro, US
Vikramjit Singh · Pflugerville, US
David Jurbergs · Fort Worth, US
Jeffrey Dean Schmulen · Austin, US
Zongxing Wang · Austin, US
Shuqiang Yang · Austin, US
Frank Y. Xu · Round Rock, US
Kang Luo · Austin, US
Marlon Edward Menezes · Austin, US
Michael Nevin Miller · Austin, US

Key dates

Filing date	Aug 22, 2017
Grant date	Nov 19, 2019
Priority date	—
Expiry date	Dec 26, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH04N9/3144
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.