Method for manufacturing color filter substrate, color filter substrate and display panel
US10481426B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 12, 2017 |
| Grant date | Nov 19, 2019 |
| Priority date | — |
| Expiry date | Dec 22, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133516
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure relates to a method for manufacturing a color filter substrate, a color substrate and a display panel in the field of display technology. The method includes: forming a color resistance layer on a basal substrate; forming a conversion layer on the basal substrate with the color resistance layer, wherein the thickness of the conversion layer is greater than the thickness of the color resistance layer and the conversion layer is convertible in color under the irradiation of preset light rays; and irradiating the conversion layer with the preset light rays so that the conversion layer is converted to a two-layer structure consisting of a black matrix (BM) pattern and a transparent over cover, wherein the BM pattern is disposed at the side of the conversion layer close to the basal substrate. In the present disclosure, it is not necessary to form the BM pattern and the over cover layer in separate two steps, because the conversion layer is formed on the basal substrate, and then is directly converted to the two-layer structure consisting of the BM pattern and the over cover layer by the preset light rays, thereby solving the problem that the method for manufactur…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.