Mask plate, method for manufacturing mask plate, method for using mask plate, and device including mask plate
US10481489B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | Aug 11, 2016 |
| Grant date | Nov 19, 2019 |
| Priority date | — |
| Expiry date | Aug 11, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask plate is provided. The mask plate includes a first transparent substrate. A first transparent electrode, an electrochromic layer and a second transparent electrode are arranged sequentially on the first transparent substrate. The first transparent electrode is configured to be selectively powered so as to form energized regions with different shapes. A method for manufacturing the mask plate, a device including the mask plate, and a method for using the mask plate are further provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.