Method and system for automatic garment fit customization
US10482642B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2017 |
| Grant date | Nov 19, 2019 |
| Priority date | — |
| Expiry date | Dec 14, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2210/16
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for automatic garment fit customization is provided. The method comprising steps for generating a garment by creating two-dimensional (2D) panels, in which the garment comprises a plurality of garment landmarks (GLMs) and a plurality of garment landmark lines (GLLs), which are key locations and lines on a surface of the garment, simulating draping of the garment on a reference body, where the reference body comprises body landmarks (BLMs) and body landmark lines (BLLs), performing a fit evaluation and calculating misfit measures comprising landmark (LM) misfits, landmark line (LL) misfits, and circumferential misfits, performing a fit adjustment for panel alteration operations modifying some of the 2D panels based on the fit evaluation, performing draping simulation with the modified 2D panels, and repeating until the misfit measures fall within a predetermined criterion and determining customized 2D panels that fit the reference body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.