Patent · US Active

Lamination device and lamination method

US10486404B2 · kind B2 · utility

2Cited by
1References
16Claims
0Family size

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Key dates

Filing dateApr 21, 2016
Grant dateNov 26, 2019
Priority date
Expiry dateApr 21, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K59/1201
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A lamination device and a lamination method for attaching a film layer onto a substrate are provided. The lamination device includes a platform configured to carry and deliver a substrate, a layer application member configured to apply the film layer onto a surface of the substrate, a first roller configured to roll on the substrate having the film layer to perform a smoothing and bubble-removing operation, a deformable layer arranged on the first roller and capable of being deformed to change a rolling dot pattern at an outer circumferential surface of the first roller, thereby to enable the rolling dot pattern to match the surface of the substrate, and an alignment mechanism configured to align the substrate with the first roller.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.