Optical sensor, manufacturing method thereof, and fluid analysis method using the same
US10488333B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2018 |
| Grant date | Nov 26, 2019 |
| Priority date | — |
| Expiry date | Mar 26, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/549
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for manufacturing an optical sensor includes forming a reflective metal layer on a substrate, forming an insulator layer on the reflective metal layer, inducing self-assembly of a metal nanostructure layer on the insulator layer, and selectively etching the insulator layer through a reactive ion etching process to form a plurality of pillars and a plurality of spaces defined by the plurality of pillars. The method for manufacturing a plasmonic optical sensor according to this embodiment facilitates the formation of nanostructures difficult to pattern and form on the large scale at a low cost, and provides a plasmonic optical sensor with repeatability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.