Patent · US Active

Etching composition

US10490417B2 · kind B2 · utility

3Cited by

2References

16Claims

0Family size

Assignee

Fujifilm Electronic Materials U.S.A., Inc. · US

Inventors

Thomas Dory · Gilbert, US
Emil A. Kneer · Mesa, US
Tomonori Takahashi · Chita, JP

Key dates

Filing date	Mar 17, 2015
Grant date	Nov 26, 2019
Priority date	—
Expiry date	Mar 17, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/02057
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

This disclosure relates to etching compositions containing 1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one metal corrosion inhibitor; 4) at least one organic solvent; 5) at least one amidine base; and 6) water.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.