Array substrate, manufacturing method thereof, display panel and display device
US10490573B2 · kind B2 · utility
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2References
2Claims
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Assignee
Inventors
Key dates
| Filing date | Nov 29, 2017 |
| Grant date | Nov 26, 2019 |
| Priority date | — |
| Expiry date | Jan 31, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D89/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a manufacturing method of an array substrate, comprising a step of forming insulation layers in a driving area and a display area of the array substrate, wherein thin film transistors are provided in both the display area and the driving area; the insulation layers are arranged between gate electrodes and active layers of the thin film transistors. A thickness of the insulation layer of the thin film transistor in the driving area is larger than a thickness of the insulation layer of the thin film transistor in the display area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.