Topographical structure and method of producing it
US10491189B2 · kind B2 · utility
1Cited by
15References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 31, 2013 |
| Grant date | Nov 26, 2019 |
| Priority date | — |
| Expiry date | Sep 17, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N30/87
- WIPO fieldBasic communication processes
- WIPO sectorElectrical engineering
Abstract
A topographical structure includes a carrier layer (TS); at least one metal layer (M) applied on the carrier layer; a marginal topology edge at the metal layer; and a structured cover (AB) at the topology edge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.