Patent · US Active

Apparatus, system and method for providing a vacuum ejector for an end effector

US10493638B1 · kind B1 · utility

1Cited by
14References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 11, 2018
Grant dateDec 3, 2019
Priority date
Expiry dateSep 11, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/6838
  • WIPO fieldHandling
  • WIPO sectorMechanical engineering

Abstract

An apparatus, system and method for providing a vacuum ejector for an end effector. Embodiments may include at least an end effector and a vacuum chamber for gripping an element during semiconductor processing. The end effector may include at least two clamp arms for placing a gripped element; a vacuum cup having a mouth capable of sealing to the gripped element to provide a vacuum chamber to the gripped element; a vacuum ejector pin extending into the vacuum chamber and including a plurality of ports substantially at a tip thereof proximate to the gripped element, wherein the vacuum is applied by the plurality of ports; and an ejector pin actuator that is capable of moving the vacuum ejector pin toward the gripped element through the vacuum chamber in the y-axis until the sealing of the mouth is broken and the gripped element is ejected.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.