Anti-reflection coating
US10494295B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Feb 4, 2016 |
| Grant date | Dec 3, 2019 |
| Priority date | — |
| Expiry date | Jul 13, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/20
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
This invention relates to a UV-curable coating material comprising an organosilica compound such as POSS or octahedral oligomeric silsesquioxane which is functionalized with a UV-curable functional group. The material further comprises at least one UV-curable cross-linker. The coating material comprises surface structures in the nano-sized range and can be used in a nanoimprint coating process where the material is coated on a substrate such as glass and a mold is pressed against the material to form an imprint before curing by UV radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.