Method of producing display panel board
US10497725B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2017 |
| Grant date | Dec 3, 2019 |
| Priority date | — |
| Expiry date | Feb 17, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/423
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method includes a conductive film forming process of forming a conductive film 51 covering a gate insulation film IS and a semiconductor film 42, the gate insulation film 45 covering a gate electrode 37G and a gate line 35G formed on a glass substrate 32 and the semiconductor film 42 formed on the gate insulation film 45 while overlapping the gate electrode 37G, a first etching process of etching the conductive film 51 and forming a source conductive film 46S connected to the semiconductor film 42 and a drain conductive film 46D connected to the semiconductor film 42, a resist forming process performed after the first etching process and forming a resist 53R covering the semiconductor film 42, the source conductive film 46S, and the drain conductive film 46D, and a second etching process performed after the resist forming process and performing etching for removing the conductive film 51 while using the resist 53R as a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.