Method of duplicating texture and pattern of natural material using low temperature embossing process
US10500783B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 29, 2016 |
| Grant date | Dec 10, 2019 |
| Priority date | — |
| Expiry date | Jul 22, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2995/002
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method of duplicating texture and pattern of a natural material using a low temperature embossing process is provided. More particularly, in the method of duplicating texture and pattern of a natural material using a low temperature embossing process, a polymer resin having low glass transition temperature is coated on a surface of the natural material and then low temperature embossing process is performed thereon at a specific temperature and a specific pressure to duplicate a distinct texture and a fine pattern of the natural material as they are, thereby improving luxurious and aesthetic properties and achieving a large area and mass production, such that it may be applied to interior and exterior materials of a car, a case of a cellular phone and a laptop, home appliances, or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.