Patent · US Active

Metrology system for positioning assemblies

US10501209B2 · kind B2 · utility

2Cited by
64References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 19, 2018
Grant dateDec 10, 2019
Priority date
Expiry dateJun 19, 2038

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P90/80
  • WIPO fieldControl
  • WIPO sectorInstruments

Abstract

A method and apparatus for maintaining a selected configuration for a structure. Metrology data for a support system is received while the support system holds the structure. A determination is made as to whether a current configuration of the structure is within selected tolerances of the selected configuration for the structure based on the metrology data. The support system is moved to move the structure held by the support system into the selected configuration in response to a determination that the current configuration of the structure is not within the selected tolerances of the selected configuration for the structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.