Method for examining object properties of an object in a substrate
US10502566B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 2015 |
| Grant date | Dec 10, 2019 |
| Priority date | — |
| Expiry date | Jul 16, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01V3/15
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for examining object properties of an object in a substrate, using an arrangement that comprises a detector device, a localization device, and a control device is provided. The method includes selecting a first object having first object properties to be examined and first target coordinates and also includes determining an actual position of the detector device using the localization device. Moreover, the method includes determining by the control device an actual detection field from the actual position of the detector device, and comparing by the control device the first target coordinates with the actual detection field of the detector device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.