Method and system using x-ray pinhole camera for in-situ monitoring of electron beam manufacturing process
US10502701B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2018 |
| Grant date | Dec 10, 2019 |
| Priority date | — |
| Expiry date | Mar 30, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An additive manufacturing system includes a cabinet, an electron beam system, at least one imaging device, and a computing device. The cabinet is configured to enclose a component and defines a pinhole extending therethrough. The electron beam system is configured to generate an electron beam directed toward the component. Interactions between the component and the electron beam generate x-ray radiation. The at least one imaging device is configured to detect the x-ray radiation through the pinhole. The computing device is configured to image the component based on the x-ray radiation detected by the at least one imaging device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.