Underwater optical metrology system
US10502829B2 · kind B2 · utility
6Cited by
20References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 10, 2018 |
| Grant date | Dec 10, 2019 |
| Priority date | — |
| Expiry date | Jul 10, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/74
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Described herein are methods and devices for improved location of any and all underwater structures or equipment installed underwater. In particular, systems are disclosed that combine optical and acoustic metrology for locating objects in underwater environments. The systems allow for relative positions of objects to be determined with great accuracy using optical techniques, and support enhanced location of devices that utilize acoustic location techniques. In addition, location information can be provided by the system even in conditions that make optical metrology techniques impossible or impractical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.