Dielectric siloxane particle films, and devices having the same
US10502995B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2015 |
| Grant date | Dec 10, 2019 |
| Priority date | — |
| Expiry date | Aug 2, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K2102/331
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A method for making a dielectric film includes a substrate on which is deposited a siloxane starting material and particles, wherein the siloxane starting material has a siloxane polymer, a siloxane oligomer and/or silane monomers, and wherein the particles have an average particle size of less than 400 nm. After deposition, heat and/or electromagnetic energy is applied to the siloxane particle layer so as to cure the layer and form a dielectric film on the substrate. The formed film is optically transmissive to visible light and transmits at least 80% of the visible light incident thereon, and is electrically insulating and has a sheet resistance of 1000 Ω/sq or more.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.