Patent · US Active

EUV Collector

US10503075B2 · kind B2 · utility

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20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ingrid Schuster · Oberkochen, DE
Wolfgang Merkel · Neu-Ulm, DE
Georgo Metalidis · Zang, DE
Holger Kierey · Aalen, DE

Key dates

Filing date	Nov 26, 2018
Grant date	Dec 10, 2019
Priority date	—
Expiry date	Nov 26, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An EUV collector for use in an EUV projection exposure apparatus includes at least one mirror surface having surface structures for scattering a used EUV wavelength (λ) of used EUV light. The mirror surface has a surface height with a spatial wavelength distribution between a lower limit spatial wavelength and an upper limit spatial wavelength. An effective roughness (rmsG) below the lower limit spatial wavelength (PG) satisfies the following relation: (4π rmsG cos(θ)/λ)2<0.1. θ denotes an angle of incidence of the used EUV light at the mirror surface. The following applies to an effective roughness (rmsGG′) between the lower limit spatial wavelength (PG) and the upper limit spatial wavelength (PG′): 1.5 rmsG<rmsGG′<6 rmsG.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.