Preparation method for array substrate
US10504941B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 24, 2017 |
| Grant date | Dec 10, 2019 |
| Priority date | — |
| Expiry date | Dec 21, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/38
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides an array substrate comprising a substrate, a metal conductive film layer, and an anti-reflective film layer located between the substrate and the metal conductive film layer, and a method for manufacturing the same, as well as a display device. The method comprises step S1: forming an anti-reflective film layer on a substrate by adjusting the reaction power and/or reactive gas flow during the formation of film by the chemical vapor deposition process; and step S2: forming a metal conductive film layer on the substrate finished in step S1. Through the preparation method of the array substrate, the anti-reflective film layer can have a sand-like granulation structure, such that light reflected from the metal conductive film layer can be blocked, thereby weakening or avoiding the light reflected from the surface of the metal conductive film layer, further improving the display effect of the array substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.