Patent · US Active

Method of production of high-refractive thin glass substrates

US10505129B2 · kind B2 · utility

1Cited by

6References

21Claims

0Family size

Assignee

Schott AG · DE

Inventors

Bernd Loeffelbein · Saulheim, DE
Frank Buellesfeld · Kriftel, DE
Andreas Langsdorf · Ingelheim am Rhein, DE

Key dates

Filing date	Apr 27, 2017
Grant date	Dec 10, 2019
Priority date	—
Expiry date	Apr 27, 2037

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E10/549
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

A redrawing method for the production of thin glasses is provided that allows redraw of high refractive index optical glasses. The includes the steps of providing a vitreous preform with a mean width B, a mean thickness D, and a refractive index nD of at least 1.68 in a redrawing device, heating at least a part of the preform, redrawing of the preform to a thin glass with a mean width b and a mean thickness d. The heated part of the preform exhibits, for the duration of at most 30 minutes, a temperature above a lower limit of devitrification of the glass. The glass of the preform exhibits a dependence of the viscosity on the temperature, which is characterized by a mean decrease of the viscosity with increasing temperature in an viscosity range of 108 to 105 dPas of at least 3*105 dPas/K.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.