Compound, photopolymerization initiator comprising said compound, and photosensitive resin composition containing said photopolymerization initiator
US10508078B2 · kind B2 · utility
2Cited by
0References
10Claims
0Family size
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Key dates
| Filing date | Dec 7, 2016 |
| Grant date | Dec 17, 2019 |
| Priority date | — |
| Expiry date | Dec 7, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2037
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1):
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.