Polishing composition and method utilizing abrasive particles treated with an aminosilane
US10508219B2 · kind B2 · utility
0Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2016 |
| Grant date | Dec 17, 2019 |
| Priority date | — |
| Expiry date | Dec 5, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31053
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.