Slurry composition and additives and method for polishing organic polymer-based ophthalmic substrates
US10508220B2 · kind B2 · utility
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21References
20Claims
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Key dates
| Filing date | Jun 13, 2016 |
| Grant date | Dec 17, 2019 |
| Priority date | — |
| Expiry date | Dec 13, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/041
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention provides a slurry composition and method for polishing organic polymer-based ophthalmic substrates. The slurry composition according to the invention includes an aqueous dispersion of abrasive particles and one of a polyvinyl alcohol compound, and a tertiary amide functionalized compound. The abrasive particles can be alumina, zirconia, silica, titania, ceria, spinel or combinations of the foregoing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.