System, method and computer program product for photometric system design and environmental ruggedization
US10509223B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2013 |
| Grant date | Dec 17, 2019 |
| Priority date | — |
| Expiry date | Nov 30, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F18/2111
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A photometric system design methodology employs genetic algorithms to optimize the selection of optical elements for inclusion in the photometric system in order to improve system performance with respect to environmental conditions (i.e., to “ruggedize” the photometric system). The genetic algorithms utilize a multi-objective fitness function to evolve simulated optical element selection, which may be a combination of optical filters and integrated computational elements. The system may also output a size reduced database that serve as simulated candidate optical elements through global optimization, or may output a fixed number of simulated optical elements through conditional optimization for actual tool implementation and calibration analysis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.