Deposition process
US10513773B2 · kind B2 · utility
0Cited by
6References
24Claims
0Family size
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Key dates
| Filing date | Feb 10, 2016 |
| Grant date | Dec 24, 2019 |
| Priority date | — |
| Expiry date | Feb 10, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/152
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for depositing an inorganic material on a substrate, the process comprising, providing a substrate having a surface, providing a precursor mixture comprising a metal sulfonate, and delivering the precursor mixture to the surface of the substrate, wherein the surface of the substrate is at a substrate temperature of above 450° C. and is sufficient to effect decomposition of the metal sulfonate. The inorganic material may include a metal or a metal oxide. The preferred metal sulfonate is metal triflate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.