Systems and methods for providing a profile of a material property using multiple analysis stations
US10514332B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2017 |
| Grant date | Dec 24, 2019 |
| Priority date | — |
| Expiry date | Jun 14, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N15/0806
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for profiling a material property are provided. A plurality of measurement devices can be configured to measure at least a portion of the material property. A controller including at least one processor can be in communication with one or more of the plurality of measurement devices. At least one measurement device of the plurality of measurement devices can measure at least one segment of the material property, and at least one additional measurement device of the plurality of measurement devices can measure at least one additional segment of the material property. The at least one segment and the at least one additional segment can be combined to provide at least a partial profile of the material property.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.