Patent · US Active

Selection method for additives in photopolymers

US10514657B2 · kind B2 · utility

0Cited by

2References

11Claims

0Family size

Assignee

Covestro Deutschland AG · DE

Inventors

Thomas Roelle · Leverkusen, DE
Friedrich-Karl Bruder · Krefeld, DE
Thomas Fäcke · Leverkusen, DE
Marc-Stephan Weiser · Leverkusen, DE
Dennis Hönel · Wichterich, DE
Christian Diedrich · Mülheim an der Ruhr, DE

Key dates

Filing date	Apr 23, 2015
Grant date	Dec 24, 2019
Priority date	—
Expiry date	Jan 18, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG11B7/0065
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a method for selecting compounds which can be used as additives in photopolymer formulations for producing light holographic media, and to photopolymer formulations which contain at least one softener which are selected according to the claimed method. The invention also relates to the use of photopolymer formulations for producing holographic media.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.