Semiconductor device and method of producing a semiconductor device
US10519034B2 · kind B2 · utility
0Cited by
0References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2018 |
| Grant date | Dec 31, 2019 |
| Priority date | — |
| Expiry date | Jan 19, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/13072
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of producing a semiconductor device includes providing a carrier structure having a semiconductor substrate; applying or introducing a precursor substance onto or into the carrier structure, treating the precursor substance for producing a porous matrix structure; introducing a functionalization substance into the porous matrix structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.