Patent · US Active

Nanocrystal preparation method, nanocrystals, and apparatus for preparing and storing dissolved gas

US10519038B2 · kind B2 · utility

1Cited by
2References
18Claims
0Family size

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Key dates

Filing dateNov 24, 2015
Grant dateDec 31, 2019
Priority date
Expiry dateNov 24, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2004/80
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A nanocrystal preparation method comprises the following steps: dissolving, in a first selected solvent, a first precursor which is in a gaseous state under normal temperature and normal pressure, to form a first precursor solution; dissolving a second precursor in a second selected solvent to form a second precursor solution, wherein the second precursor is a precursor of a metal element of Group I, Group II, Group III or Group IV; and in an inert gas atmosphere, adding the first precursor solution into a reaction vessel which contains the second precursor solution, wherein the first precursor chemically reacts with the second precursor to generate a nanocrystal. The present invention further discloses a nanocrystal prepared by the above method and an apparatus for preparing and storing a gas-dissolved solution. With the preparation method according to the invention, the amount of the first precursor in a gaseous state can be accurately controlled, the reaction is more uniform and more controllable, and the obtained nanocrystal has uniform volume distribution and a higher luminescent quantum yield.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.