Wavefront measurement device and optical system assembly device
US10527518B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 22, 2016 |
| Grant date | Jan 7, 2020 |
| Priority date | — |
| Expiry date | Aug 22, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/0207
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A light source system (26) illuminating an optical system to be inspected (3) and making light fluxes of a plurality of wavefront measurement visual fields be emitted from the optical system to be inspected; a single wavefront sensor (28) calculating wavefront aberration on a basis of measurement of the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected (3); and an optical path optical system (31) are included. The optical path optical system selectively makes the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected (3) be incident on the wavefront sensor (28).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.