Systems and methods for generating a patterned orthotic device
US10528032B2 · kind B2 · utility
1Cited by
3References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2015 |
| Grant date | Jan 7, 2020 |
| Priority date | — |
| Expiry date | Nov 7, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/49007
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for generating an orthotic device is disclosed. In one implementation, the method includes generating CAD model data corresponding to an orthotic device to be applied to a body part of a patient. A pattern is mapped to a surface defined by the CAD model data to produce modified CAD model data, the mapped pattern defining a plurality of perforations formed at least partially through the surface. The modified CAD model data is transmitted to a three-dimensional printer. The three-dimensional printer is to produce the orthotic device having the plurality of perforations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.