Patent · US Active

Device for treating substrates

US10529606B2 · kind B2 · utility

0Cited by

2References

16Claims

0Family size

Assignee

RENA Technologies GmbH · DE

Inventors

Stefan-Heinrich Hansen · Waldkirch, DE
Markus Uihlein · Glückstadt, DE
Bernd-Uwe Sander · Freiburg (Elbe), DE
Stephan Alexis Pediaditakis · Heuweiler, DE

Key dates

Filing date	Dec 3, 2015
Grant date	Jan 7, 2020
Priority date	—
Expiry date	Dec 3, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67706
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A device treats substrates with a liquid, which device has a conveying device by which the substrates can be conveyed in a conveying direction through a container containing a liquid. A weir has an edge over which the substrates can run and which, at least in sections, extends obliquely relative to the conveying direction of the substrates. The weir is used in the device for treating substrates with a liquid. The weir has at least one edge which extends obliquely at least in sections.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.