Nanoscale SOFC electrode architecture engineered using atomic layer deposition
US10529975B2 · kind B2 · utility
2Cited by
1References
13Claims
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Key dates
| Filing date | Jul 31, 2015 |
| Grant date | Jan 7, 2020 |
| Priority date | — |
| Expiry date | Apr 6, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
One embodiment includes forming surface-modifying phases on a surface of a functional electrode via atomic layer deposition and controlling the chemistry of constituent phases, the crystalline nature of the constituent phases and the thickness of the surface-modifying phase via the atomic layer deposition such that the thickness is between about 2 nm to about 200 nm. The surface-modifying phases enhances the performance of electrocatalytic activity of the functional electrode and the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.