Patent · US Active

Methods for optical system manufacturing

US10534143B1 · kind B1 · utility

10Cited by
11References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 20, 2018
Grant dateJan 14, 2020
Priority date
Expiry dateSep 20, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01S7/4818
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example method includes providing a first substrate that has a plurality of light-emitter devices disposed on a first surface. The method includes providing a second substrate that has a mounting surface defining a reference plane. The method includes forming a structure and an optical spacer on the mounting surface of the second substrate. The method additionally includes coupling the first and second substrates together such that the first surface of the first substrate faces the mounting surface of the second substrate at an angle with respect to the reference plane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.