Plasma diffuser method and apparatus
US10535500B2 · kind B2 · utility
0Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 22, 2015 |
| Grant date | Jan 14, 2020 |
| Priority date | — |
| Expiry date | May 13, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3323
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method is provided for at least partially preventing discolouration of a substrate by a plasma coating process, by diffusing a plasma prior to and/or during depositing of said plasma on said substrate to form a coating. Also provided is a plasma coating apparatus comprising a plasma diffuser for homogenizing a plasma density nearby a substrate to be coated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.