Hollow cathode plasma source

US10535503B2 · kind B2 · utility

Assignees

• AGC GLASS EUROPE · BE
• AGC FLAT GLASS NORTH AMERICA, INC. · US
• ASAHI GLASS CO., LTD. · JP

Inventors

• Thomas Biquet · Gosselies, BE
• Peter Maschwitz · Sebastopol, US
• John Chambers · San Francisco, US
• Hughes Wiame · Gosselies, BE

Key dates

• Filing date: Dec 5, 2014
• Grant date: Jan 14, 2020
• Expiry date: Dec 5, 2034

Classification

• Technology area (CPC —): General

Abstract

The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).