Metallic microstructures with reduced-visibility and methods for producing same
US10537028B2 · kind B2 · utility
0Cited by
9References
13Claims
0Family size
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Key dates
| Filing date | Jun 26, 2015 |
| Grant date | Jan 14, 2020 |
| Priority date | — |
| Expiry date | Nov 1, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/11
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Electrically conductive patterns formed on a substrate are provided with a reduced visibility. A region of a major surface of the substrate is selectively roughened to form a roughened pattern on the major surface of the substrate. Electrically conductive traces are directly formed on the roughened region and are conformal with the roughened pattern on the major surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.