Defect reduction rinse solution containing ammonium salts of sulfoesters

US10538724B2 · kind B2 · utility

Assignee

• BAFS SE · DE

Inventors

• Christian Bittner · Bensheim, DE
• Guenter Oetter · Bischofswerda, DE
• Andrei Honciuc · Iași, RO
• Andreas Klipp · Lambsheim, DE
• Simon Braun · Mannheim, DE

Key dates

• Filing date: Jul 1, 2016
• Grant date: Jan 21, 2020
• Expiry date: Dec 21, 2036

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C11D2111/22
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The present invention relates to the use of a composition comprising one or more ammonium salt(s) of one or more compounds selected from the group consisting of sulfobutanedioic acid diester(s), (sulfomethyl)-butanedioic acid diester(s), methyl-sulfobutanedioic acid diester(s), sulfoglutaric acid diester(s), and sulfotricarballic acid triester(s), for cleaning or rinsing a product comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm and below. The invention also relates to a corresponding method of making a cleaned or rinsed product comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm or below. The invention also relates to a solution with color of HAZEN number below 1000 and/or a turbidity in the range of from 0.08 to 10 NTU, wherein the solution comprises water and one or more ammonium salt(s) and optionally one or more organic solvent compounds. The invention also relates to a method of making a corresponding solution.