Patent · US Active

Method and device for determining an OPC model

US10539865B2 · kind B2 · utility

0Cited by

3References

24Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Holger Seitz · Jena, DE
Thomas Thaler · Jena, DE
Ute Buttgereit · Jena, DE
Thomas Trautzsch · Oil City, US

Key dates

Filing date	Sep 26, 2017
Grant date	Jan 21, 2020
Priority date	—
Expiry date	Dec 23, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70666
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method is provided for determining an OPC model comprising: recording an aerial image by use of a mask inspection microscope, wherein the aerial image comprises at least one segment of a mask; simulating a plurality of aerial images which comprise at least the segment, proceeding from a mask design and from predefined parameters of an optical model which is part of the OPC model, wherein the parameters differ for each of the simulated aerial images of the plurality of aerial images; determining differences between the measured aerial image and the simulated aerial images; determining those parameters for which the differences between simulated aerial image and measured aerial image are the least.In addition, a mask inspection microscope for carrying out the method is provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.