Coating compositions suitable for use with an overcoated photoresist
US10539873B2 · kind B2 · utility
1Cited by
25References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 26, 2015 |
| Grant date | Jan 21, 2020 |
| Priority date | — |
| Expiry date | Jan 26, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.