Multi-stage deposition system for growth of inclined c-axis piezoelectric material structures
US10541663B2 · kind B2 · utility
5Cited by
13References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 13, 2016 |
| Grant date | Jan 21, 2020 |
| Priority date | — |
| Expiry date | Oct 13, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N30/09
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Systems and methods for growing hexagonal crystal structure piezoelectric material with a c-axis that is tilted (e.g., 25 to 50 degrees) relative to normal of a face of a substrate are provided. A deposition system includes a linear sputtering apparatus, a translatable multi-aperture collimator, and a translatable substrate table arranged to hold multiple substrates, with the substrate table and/or the collimator being electrically biased to a nonzero potential. An enclosure includes first and second deposition stations each including a linear sputtering apparatus, a collimator, and a deposition aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.