Patent · US Active

Microperturbation assembly system and method

US10543486B2 · kind B2 · utility

5Cited by
142References
35Claims
0Family size

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Inventors

Key dates

Filing dateOct 2, 2017
Grant dateJan 28, 2020
Priority date
Expiry dateMay 31, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/036
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Microperturbation fluidic assembly systems and methods are provided for the fabrication of emissive panels. The method provides an emissive substrate with a top surface patterned to form an array of wells. A liquid suspension is formed over the emissive substrate top surface, comprising a first liquid and emissive elements. Using an array of micropores, a perturbation medium, which optionally includes emissive elements, is injected into the liquid suspension. The perturbation medium may be the first liquid, a second liquid, or a gas. A laminar flow is created in the liquid suspension along the top surface of the emissive substrate in response to the perturbation medium, and emissive elements are captured in the wells. The ejection of the perturbation medium can also be used to control the thickness of the liquid suspension overlying the top surface of the emissive substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.