Patent · US Active

Management method for a sample processing apparatus

US10545159B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

Sysmex Corporation · JP

Inventors

Junzo Yamamoto · Kobe, JP
Shigeo Kanamori · Naha, JP
Fumio Inoue · Yokohama, JP
Ikuya Takenaka · Mitaka, JP
Osamu Hirota · Yokohama, JP

Key dates

Filing date	Nov 14, 2016
Grant date	Jan 28, 2020
Priority date	—
Expiry date	May 13, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG16H40/40
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A managing method for a sample processing apparatus involving the sample processing apparatus and a management apparatus. The method includes requesting an approval of self-adjustment to the management apparatus from the sample processing apparatus before performing a self-adjustment. Informing the sample processing apparatus of approval of request from the management apparatus, when approving the sample processing apparatus to perform the self-adjustment, and performing a self-adjustment by the sample processing apparatus when the sample processing apparatus is informed that the request has been approved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.